Manufacturing Photographic templates for photolithographic processes in the manufacture of microelectronics products, film electronics, micromechanics, microfluids.
Photomodels are made on the hi-tech equipment by methods of massless lithography with use of lasers or an electronic beam.
Photo Template Parameters
Plate sizes: 102x102 mm, 127x127 mm
Substrate material
- fused quartz
- alkaline glass
Coverage
- chromium
- iron oxide
Scale
- for contact lithography: 1:1
- for projection lithography: 10:1, 5:1, 4:1
Dimensions
Minimum size on the photo template (microns) | Size tolerance (±µm) | Combination (microns) | Defects |
| 0,5-0,7 | 0,05 – 0,08 | ≥ 0.10 | ≥ 0.20 |
| 1-2 | ≥ 0,1 | ≥ 0.10 | ≥ 0.20 |
| 2,5-5 | ≥ 0,2 | ≥ 0.10 | ≥ 0.50 |
| >5 | ≥ 0,2 | ≥ 0.10 | ≥ 0.50 |
Information files in formats:
dwg, dxf, gds II, sou, ldb, cif ... and other CAD formats as agreed.